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Intervalley splitting and intersubband transitions in n-type Si/SiGe quantum wells: pseudopotential vs. effective mass calculation

机译:在n型si / siGe中的Intervalley分裂和子带间跃迁   量子阱:赝势与有效质量计算

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摘要

Intervalley mixing between conduction-band states in low-dimensional Si/SiGeheterostructures induces splitting between nominally degenerate energy levels.The symmetric double-valley effective mass approximation and the empiricalpseudopotential method are used to find the electronic states in differenttypes of quantum wells. A reasonably good agreement between the two methods isfound, with the former being much faster computationally. Aside from being anoscillatory function of well width, the splitting is found to be almostindependent of in-plane wave vector, and an increasing function of themagnitude of interface gradient. While the model is defined for symmetricenvelope potentials, it is shown to remain reasonably accurate for slightlyasymmetric structures such as a double quantum well, making it acceptable forsimulation of multilayer intersubband optical devices. Intersubband opticaltransitions are investigated under both approximations and it is shown that inmost cases valley splitting causes linewidth broadening, although under extremeconditions, transition line doublets may result.
机译:低维Si / SiGe异质结构中导带状态之间的谷值混合引起名义上简并能级之间的分裂。对称双谷有效质量逼近和经验伪拟势方法用于找到不同类型量子阱中的电子态。在这两种方法之间找到了相当好的协议,而前一种在计算上要快得多。除了是井宽的起伏函数外,还发现分裂几乎与平面波矢量无关,并且与界面梯度幅度的增大函数无关。虽然该模型是为对称包络势定义的,但对于轻微不对称的结构(例如双量子阱),该模型显示出合理的精度,这使其可以用于多层子带间光学器件的仿真。在两种近似情况下都对子带间光跃迁进行了研究,结果表明,在大多数情况下,谷值分裂会引起线宽加宽,尽管在极端条件下,可能会导致跃迁线成对。

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